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MANUFACTURING METHOD OF LAMINATED THIN PLATE AND LAMINATED THIN PLATE

机译:层合薄板的制造方法及层合薄板

摘要

To provide a laminated thin plate having good flatness even in a thin and wide state, and to provide a method for manufacturing the laminated thin plate.SOLUTION: The manufacturing method for a laminated thin plate includes a bonding step for bonding a thin plate for an inner layer and a thin plate for an outer layer to obtain an intermediate laminated material in which the thin plate for an outer layer is bonded to both surfaces of the thin plate for an inner layer, an annealing step for annealing the intermediate laminated material, and a rolling step for cold-rolling the annealed intermediate laminated material. Here, the thin plate for an inner layer is composed of a metal selected from the group consisting of Cu, Al, a Cu-base alloy, and an Al-base alloy. The thin plate for an outer layer is composed of an Fe-Ni alloy containing of Ni+Co of 28.0-52.0% in which Co is 0-6.0%, Si of 0.5% or lower, Mn of 1.0% or lower, and the balance Fe and inevitable impurities. The laminated thin plate has a maximum steepness of 2.5% or less in a thickness of 1.0 mm or less and in a length of 800 mm.SELECTED DRAWING: None
机译:为了提供一种即使在薄且宽的状态下也具有良好的平坦度的层压薄板,并提供一种制造该层压薄板的方法。内层和用于外层的薄板以获得中间层压材料,其中将用于外层的薄板粘合到用于内层的薄板的两个表面上,用于退火该中间层压材料的退火步骤,和用于冷轧退火的中间层压材料的轧制步骤。在此,内层用薄板由选自Cu,Al,Cu基合金和Al基合金的金属构成。用于外层的薄板由Fe-Ni合金组成,该Fe-Ni合金包含28.0-52.0%的Ni + Co,其中Co为0-6.0%,Si为0.5%以下,Mn为1.0%以下,并且平衡铁和不可避免的杂质。层压薄板的厚度在1.0毫米以下或在800毫米以下时,最大陡度为2.5%或以下。

著录项

  • 公开/公告号JP2019112718A

    专利类型

  • 公开/公告日2019-07-11

    原文格式PDF

  • 申请/专利权人 HITACHI METALS LTD;

    申请/专利号JP20180239772

  • 发明设计人 MORI HIDEKI;OMORI AKIHIRO;

    申请日2018-12-21

  • 分类号C21D9/46;B21B1/38;C22C38;C22C38/10;C22C19/03;B32B15/01;B23K20/04;B21B1/22;

  • 国家 JP

  • 入库时间 2022-08-21 12:25:24

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