首页> 外国专利> LASER PROCESSING METHOD FOR ADJUSTING FOCAL SHIFT ACCORDING TO KIND AND LEVEL OF CONTAMINATION IN EXTERNAL OPTICAL SYSTEM BEFORE LASER PROCESSING

LASER PROCESSING METHOD FOR ADJUSTING FOCAL SHIFT ACCORDING TO KIND AND LEVEL OF CONTAMINATION IN EXTERNAL OPTICAL SYSTEM BEFORE LASER PROCESSING

机译:激光加工前根据外部光学系统的污染种类和水平调整焦距的激光加工方法

摘要

To adjust focal shift according to the kind and the level of contamination in an external optical system before laser processing.SOLUTION: A laser processing method includes steps of: before laser processing, calculating a focus movement amount based on a first measurement value which is an energy amount of a laser beam passing through a small diameter hole S, measured in the state where an external optical system 12 is warmed, and on a first reference value (database D1) determined beforehand corresponding to the kind of contamination in the external optical system 12 relative to the first measurement value; and correcting a focal position at a laser processing time based on the calculated focus movement amount.SELECTED DRAWING: Figure 5
机译:解决方案:一种激光处理方法包括以下步骤:在激光处理之前,根据第一测量值计算焦点移动量,该第一测量值是通过小直径孔S的激光束的能量,在加热外部光学系统12的状态下测得,并根据与外部光学系统中的污染种类预先确定的第一参考值(数据库D1)进行测量相对于第一测量值12;并根据计算出的焦点移动量在激光处理时校正焦点位置。选定的绘图:图5

著录项

  • 公开/公告号JP2019038000A

    专利类型

  • 公开/公告日2019-03-14

    原文格式PDF

  • 申请/专利权人 FANUC LTD;

    申请/专利号JP20170160490

  • 发明设计人 IZUMI TAKASHI;

    申请日2017-08-23

  • 分类号B23K26/046;B23K26;B23K26/042;

  • 国家 JP

  • 入库时间 2022-08-21 12:24:53

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