METHOD FOR FORMING DECORATIVE OR TECHNICAL PATTERN ON OBJECT MADE OF AT LEAST PARTLY LIGHT-TRANSMISSIVE AMORPHOUS, SEMI-CRYSTALLINE, OR CRYSTALLINE MATERIAL

摘要

To provide a method for rapidly forming a pattern in the thickness direction of an at least partially light transmissive material.SOLUTION: A mask 24 in which an opening 25 corresponding to the contour of a decorative pattern or a technical pattern 22 is formed on at least one of the upper surface 18a and the lower surface 18b of at least partly light transmissive material, and the decorative pattern or the technical pattern 22 is formed by etching on the upper surface 18a or the lower surface 18b of the material by irradiating a mask 24 with a unitary or multivalent ion beam 14.SELECTED DRAWING: Figure 2