Water quality evaluation device and water quality evaluation method

摘要

The present invention provides a water quality evaluation apparatus and a water quality evaluation method capable of accurately evaluating all impurities present in ultrapure water for cleaning semiconductor wafers with a high detection probability. The present invention is a water quality evaluation apparatus, comprising: processing means for performing specific processing or operation on a substrate to be measured; and support means for horizontally supporting the substrate to be measured with its surface facing upward. Dropping means for dropping the water to be evaluated on the surface of the substrate to be measured which has been subjected to a specific processing or operation, and analysis to analyze the watermark formed on the surface of the substrate to be measured after drying the water to be measured And means. [Selected figure] Figure 2