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CHARGED PARTICLE BEAM IRRADIATION DEVICE AND METHOD OF REDUCING ELECTRIC CHARGE BUILD-UP ON SUBSTRATE

机译:带电粒子束辐照装置和减少基体上电荷累积的方法

摘要

To provide a device which can reduce an electric charge build-up or/and remove a contaminant without affecting a magnetic field generated by an electromagnetic lens included in an original charged particle beam optical system of a device for radiating a charged particle beam.SOLUTION: The irradiation device 100 comprises: an electron gun 201 for launching an electron beam; an objective lens 207 for refracting the electron beam; a plurality of electrodes 220, 222, 224, 226 which are disposed in a magnetic field space of the objective lens 207 so as to surround a space outside an electron beam passing region; and an electric potential control circuit 124 which generates plasma in the space surrounded by the plurality of electrodes, and controls an electric potential of the plurality of electrodes so as to control the movement of a positive ion or an electron and a negative ion which are produced by the plasma. In the irradiation device, a positive ion, an electron and a negative ion, or active species are emitted from the space of the plasma.SELECTED DRAWING: Figure 1
机译:提供一种能够减少电荷积累或/和去除污染物而不影响由用于辐射带电粒子束的设备的原始带电粒子束光学系统中包括的电磁透镜产生的磁场的设备。照射装置100包括:用于发射电子束的电子枪201;以及用于发射电子束的电子枪201。物镜207,用于使电子束折射。多个电极220、222、224、226设置在物镜207的磁场空间内,以包围电子束通过区域外的空间。电位控制电路124,其在由多个电极围绕的空间中产生等离子体,并控制多个电极的电位,以控制所产生的正离子或电子和负离子的运动。由等离子。在辐照装置中,等离子体空间会发射出正离子,电子和负离子或活性物质。图1

著录项

  • 公开/公告号JP2019062069A

    专利类型

  • 公开/公告日2019-04-18

    原文格式PDF

  • 申请/专利权人 NUFLARE TECHNOLOGY INC;

    申请/专利号JP20170185151

  • 发明设计人 OGASAWARA MUNEHIRO;

    申请日2017-09-26

  • 分类号H01L21/027;G03F7/20;H01J37/20;

  • 国家 JP

  • 入库时间 2022-08-21 12:23:13

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