首页> 外国专利> ELECTROLESS NICKEL-PHOSPHORUS-COBALT PLATING BATH AND ELECTROLESS NICKEL-PHOSPHORUS-COBALT PLATING FILM

ELECTROLESS NICKEL-PHOSPHORUS-COBALT PLATING BATH AND ELECTROLESS NICKEL-PHOSPHORUS-COBALT PLATING FILM

机译:无电解镍磷钴镀膜和无电解镍磷钴镀膜

摘要

PROBLEM TO BE SOLVED: To provide an electroless nickel-phosphorus-cobalt plating bath capable of forming an electroless nickel-phosphorus-cobalt plating film having a high hardness and excellent in wear resistance and appearance without causing the instability of the plating bath.;SOLUTION: The electroless nickel-phosphorus-cobalt plating bath comprises: water-soluble nickel sa hypophosphite; a cobalt containing compound; a heavy metal compound; and at least one kind selected from a group consisting of an acetylene compound, an iodide or iodate ion source and a nitro group containing aromatic compound including one or more nitro groups. The concentration of the acetylene compound is 10-120 mg/L; the concentration of the iodide or iodate ion source is 10-4000 mg/L; and the concentration of the nitro group containing aromatic compound is 0.1-5000 mg/L.;SELECTED DRAWING: None;COPYRIGHT: (C)2019,JPO&INPIT
机译:解决的问题:提供一种化学镀镍-磷-钴镀浴,该镀浴能够形成具有高硬度,优异的耐磨性和外观且不会引起镀浴的不稳定性的化学镀镍-磷-钴镀膜。 :化学镍磷钴镀液包括:水溶性镍盐;次磷酸盐含钴化合物;重金属化合物;选自乙炔化合物,碘化物或碘酸盐离子源和包含一个或多个硝基的含硝基的芳香族化合物中的至少一种。乙炔化合物的浓度为10-120 mg / L;碘化物或碘酸盐离子源的浓度为10-4000 mg / L;含硝基芳香族化合物的浓度为0.1-5000 mg / L .;部分提要:无;版权:(C)2019,日本特许进阶

著录项

  • 公开/公告号JP2019085607A

    专利类型

  • 公开/公告日2019-06-06

    原文格式PDF

  • 申请/专利权人 C UYEMURA & CO LTD;

    申请/专利号JP20170214040

  • 发明设计人 SATO MASAAKI;KUROSAKA SEIGO;

    申请日2017-11-06

  • 分类号C23C18/50;H05K3/18;

  • 国家 JP

  • 入库时间 2022-08-21 12:23:11

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号