Lanterned tungsten ion source and beamline components

摘要

An ion implantation system is provided having one or more conductive components. The conductive component is comprised of one or more of (i) tungsten with lanthanum and (ii) a refractory metal alloyed mixed with a predetermined proportion of rare earth metal. The conductive component may be a component of an ion source. The components of the ion source are, for example, one or more of a cathode, a cathode shield, a repeller, a liner, an aperture plate, an arc chamber body, and a strike plate. The aperture plate may be associated with one or more of the extraction aperture, the suppression aperture, and the ground aperture.