CHAMBER, METHOD FOR PRODUCING CHAMBER, CHAMBER MAINTENANCE METHOD, PLASMA TREATMENT DEVICE, AND PLASMA TREATMENT METHOD

摘要

To suppress chamber damage, prevent the occurrence of particles, and reduce the number of times of chamber maintenance, in plasma treatment.SOLUTION: The present invention provides a chamber 4 in which plasma treatment is performed in its inside (SP). Of the inner surface 15g of a wall part 15c of the chamber 4, in the vicinity of an electrode 5 for plasma generation, a coat C of inorganic substance is partially provided.SELECTED DRAWING: Figure 1