METHOD AND APPARATUS FOR REDUCING EROSION RATE OF SURFACE EXPOSED TO HALOGEN-CONTAINING PLASMA

摘要

To provide a ceramic article having durability against erosion by a halogen-containing plasma to be used for semiconductor processing.SOLUTION: The ceramic article comprises a body and a ceramic coating formed on the body. The ceramic coating is resistive to erosion by a halogen-containing plasma. The ceramic coating contains yttrium oxide at a concentration ranging from 55 mol% to 80 mol% and zirconium oxide at a concentration ranging from 20 mol% to 45 mol%.SELECTED DRAWING: Figure 2B