METHOD AND APPARATUS FOR REDUCING EROSION RATE OF SURFACE EXPOSED TO HALOGEN-CONTAINING PLASMA

摘要

To provide a ceramic article having durability against erosion by a halogen-containing plasma to be used for semiconductor processing.SOLUTION: A method for producing an article having a coating durable against erosion by a halogen-containing plasma is provided, which uses technology selected from the group consisting of thermal spray, plasma spray, sputtering, chemical vapor phase deposition, and calcination. A ceramic coating is provided, which contains yttrium oxide at a concentration ranging from 80 mol% to 55 mol% and zirconium oxide at a concentration ranging from 20 mol% to 45 mol%. A method for producing a bulk ceramic article having durability against a halogen-containing plasma is provided, in which a bulk ceramic article is formed by sintering a green body, and by the sintering, a solid solution ceramic is formed. The solid solution ceramic contains yttrium oxide at a concentration ranging from 55 mol% to 80 mol% and zirconium oxide at a concentration ranging from 20 mol% to 45 mol%.SELECTED DRAWING: Figure 1A