The present invention provides a resin composition with which a substrate for electronic-circuit formation or a substrate for semiconductor-circuit formation can be bonded to a supporting substrate and which, in the state of being bonding a substrate for electronic-circuit formation or substrate for semiconductor-circuit formation that has a thickness of 1-100 µm, has excellent heat resistance. The resin composition undergoes no change in adhesive strength even through production steps for electronic components, semiconductor devices, etc., and can be thereafter removed at room temperature under mild conditions. The present invention further provides: an adhesive, a resin layer, a layered film, and a processed wafer each comprising or obtained using the resin composition; and a process for producing an electronic component or semiconductor device using these. The resin composition of the present invention comprises (a) a polyimide resin having a specific structure and (b) a crosslinking agent containing a fluorene group.
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