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Superhydrophobic and self-cleaning substrate and a method of coating

机译:超疏水和自清洁基材及涂覆方法

摘要

A superhydrophobic and self-cleaning surface including a substrate and a superhydrophobic layer. The superhydrophobic layer having a reacted form of octadecyltrichlorosilane. The octadecyltrichlorosilane is disposed on and crosslinked to a surface of the substrate via surface hydroxyl groups. The surface exhibits a rms roughness of 40 nm to 60 nm, a water contact angle of 155° to 180°, and a contact angle hysteresis of less than 15°. A method of preparing the substrate with a superhydrophobic and self-cleaning surface including treating a substrate with a plasma treatment, contacting the substrate with water or an alcohol to form an hydroxylated substrate, contacting the hydroxylated substrate with a solution of octadecyltrichlorosilane in an alkane solvent at a concentration in the range of 0.05 M to 0.3 M, and drying the solution on to the substrate under ambient air to form the superhydrophobic and self-cleaning surface on the substrate.
机译:一种超疏水且自清洁的表面,包括基材和超疏水层。具有疏水形式的十八烷基三氯硅烷的超疏水层。十八烷基三氯硅烷通过表面羟基被置于并交联到基底的表面上。该表面的均方根粗糙度为40 nm至60 nm,水接触角为155°至180°,接触角滞后小于15°。一种制备具有超疏水性和自清洁表面的基材的方法,该方法包括用等离子体处理基材,使基材与水或醇接触以形成羟基化的基材,并使羟基化的基材与十八烷基三氯硅烷在烷烃溶剂中的溶液接触。以0.05M至0.3M范围内的浓度,将溶液在环境空气下干燥到基材上,以在基材上形成超疏水和自清洁的表面。

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