首页> 外国专利> Dual-homodyne laser interferometric nanometer displacement measuring apparatus and method based on phase modulation

Dual-homodyne laser interferometric nanometer displacement measuring apparatus and method based on phase modulation

机译:基于相位调制的双全息激光干涉纳米位移测量装置及方法

摘要

The present invention discloses a dual-homodyne laser interferometric nanometer displacement measuring apparatus and method based on phase modulation. The linearly polarized beam with single wavelength emitted from a single frequency laser is projected onto a dual-homodyne laser interferometer consisting of four beam splitters and two retroreflectors to respectively form a measurement interference signal and a reference interference signal received by two photodetectors, respectively; an electro-optic phase modulator is placed in the optical path and a periodic sawtooth-wave voltage signal is applied to modulate the measurement and reference DC interference signals into AC interference signals; the measured displacement is obtained by detecting the variation of the phase difference between the two interference signals caused by the movement of the measured object. The present invention overcomes the error arising from DC drift in the homodyne laser interferometer and avoids the sinusoidal error caused by the direct subdivision of the interference signal or non-quadrature error of measurement interference signal. The present invention is applicable for the precision displacement measurement with sub-nanometer level accuracy in the fields of high-end equipment manufacturing and processing.
机译:本发明公开了一种基于相位调制的双全息激光干涉纳米位移测量装置及方法。由单频激光器发出的单波长线偏振光束被投射到由四个分束器和两个后向反射器组成的双全息干涉仪上,分别形成测量干涉信号和两个光电探测器接收的参考干涉信号。在光路上放置电光相位调制器,并施加周期性的锯齿波电压信号,将测量和参考直流干扰信号调制为交流干扰信号。通过检测由被测物体的运动引起的两个干涉信号之间的相位差变化来获得被测位移。本发明克服了零差激光干涉仪中由DC漂移引起的误差,避免了由直接细分干扰信号或测量干扰信号的非正交误差引起的正弦误差。本发明适用于高端设备制造和加工领域中具有亚纳米级精度的精密位移测量。

著录项

  • 公开/公告号US10151573B2

    专利类型

  • 公开/公告日2018-12-11

    原文格式PDF

  • 申请/专利权人 ZHEJIANG SCI-TECH UNIVERSITY;

    申请/专利号US201615554217

  • 发明设计人 LIPING YAN;BENYONG CHEN;

    申请日2016-07-22

  • 分类号G01B9/02;

  • 国家 US

  • 入库时间 2022-08-21 12:14:52

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