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Systems and methods for tailoring ion energy distribution function by odd harmonic mixing
Systems and methods for tailoring ion energy distribution function by odd harmonic mixing
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机译:通过奇次谐波混合调整离子能量分布函数的系统和方法
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摘要
Systems and methods for controlling a process applied to a substrate within a plasma chamber are described. The systems and methods include generating and supplying odd harmonic signals and summing the odd harmonic signals to generate an added signal. The added signal is supplied to an electrode within the plasma chamber for processing the substrate. The use of odd harmonic signals facilitates high aspect ratio etching of the substrate.
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