SCANNING EXPOSURE DEVICE, MANUFACTURING METHOD OF SCANNING EXPOSURE DEVICE AND CONTROL METHOD OF SCANNING EXPOSURE DEVICE

摘要

A scanning exposure device including: a first and a second light sources emitting a first and second beam, respectively; a polygon mirror having reflecting surfaces; a first and a second optical sensors detecting the first and the second beam, respectively; and a controller storing first writing time until which an exposure by the first beam starts after the first beam is detected and second writing time until which an exposure by the second beam starts after the first beam is detected, for respective reference surface identifiers specifying the respective reflecting surfaces, and the controller acquires a first timing at which the first beam is detected and a second timing at which the second beam is detected for the respective reflecting surfaces identified by respective acquisition surface identifiers; and specifies a correspondence relation between the respective reference surface identifiers and the respective acquisition surface identifiers.