首页> 外国专利> METHOD FOR PRODUCING PLATED COMPONENT, PLATED COMPONENT, CATALYTIC ACTIVITY INHIBITOR AND COMPOSITE MATERIAL FOR ELECTROLESS PLATING

METHOD FOR PRODUCING PLATED COMPONENT, PLATED COMPONENT, CATALYTIC ACTIVITY INHIBITOR AND COMPOSITE MATERIAL FOR ELECTROLESS PLATING

机译:无电镀覆的镀层成分,镀层成分,催化活性抑制剂及复合材料的制造方法

摘要

A method for producing a plated part, includes: forming, on a surface of a base member, a catalyst activity inhibiting layer containing a polymer which has at least one of an amide group and an amino group; irradiating with light or heating a part of the surface of the base member on which the catalyst activity inhibiting layer is formed; applying an electroless plating catalyst to the surface of the base member heated or irradiated with the light; and bringing an electroless plating solution into contact with the surface of the base member to which the electroless plating catalyst is applied, to form an electroless plating film at a light-irradiated portion or a heated portion of the surface.
机译:一种电镀部件的制造方法,包括:在基材的表面上形成催化剂活性抑制层,该催化剂活性抑制层包含具有酰胺基和氨基中的至少一个的聚合物。用光照射或加热其上形成有催化剂活性抑制层的基础构件的一部分表面;在被加热或照射了光的基材的表面上涂布化学镀催化剂。使化学镀液与涂布有化学镀催化剂的基材的表面接触,从而在表面的光照射部或加热部形成化学镀膜。

著录项

  • 公开/公告号US2019008051A1

    专利类型

  • 公开/公告日2019-01-03

    原文格式PDF

  • 申请/专利权人 MAXELL HOLDINGS LTD.;

    申请/专利号US201816122404

  • 发明设计人 NAOKI USUKI;AKIKO KITO;ATSUSHI YUSA;

    申请日2018-09-05

  • 分类号H05K3/18;H05K3/46;C23C18/20;C08L33/26;C08L81/02;C08G83;

  • 国家 US

  • 入库时间 2022-08-21 12:05:53

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