Method for producing doped carbon layers on metallic layers by RF PACVD method

摘要

the object of the application is the manufacture of carbon doped layers on substrates like metallic rf method pacvd, characterised by the fact that in the reactor plazmowo - chemical, during affixing carbon layer.leads simultaneously process spraying material admixture with additional high frequency electrodes reactor supplied with potential negative individual energy sources by ion bombardment of the electrodes, where the plasma high frequency.