首页> 外国专利> CLEANING DEVICE, SUBSTRATE PROCESSING DEVICE, CLEANING DEVICE MAINTENANCE METHOD, AND COMPUTER-READABLE RECORDING MEDIUM INCLUDING CLEANING DEVICE MAINTENANCE PROGRAM

CLEANING DEVICE, SUBSTRATE PROCESSING DEVICE, CLEANING DEVICE MAINTENANCE METHOD, AND COMPUTER-READABLE RECORDING MEDIUM INCLUDING CLEANING DEVICE MAINTENANCE PROGRAM

机译:清洁设备,基板处理设备,清洁设备维护方法以及包括清洁设备维护程序的计算机可读记录介质

摘要

A cleaning device is disclosed. According to an embodiment, the cleaning device is provided with a cleaning member, a moving unit, a measurement unit, and a control unit. The control unit, before cleaning, causes the cleaning member to be pressed onto a reference member and, after a measured value from the measurement unit has reached a predetermined resetting load, causes the cleaning member to be moved in a direction away from the reference member. At the point in time when measured values from the measurement unit became equal at least twice successively per unit amount of movement of the cleaning member, the control unit performs a reset operation in which the position of the cleaning member at the point in time is set as the reference position of the cleaning member during cleaning, and in which the measured value from the measurement unit at the point in time is set as a pressing reference value during cleaning.
机译:公开了一种清洁装置。根据一个实施例,清洁装置设置有清洁构件,移动单元,测量单元和控制单元。在清洁之前,控制单元使清洁部件被按压到基准部件上,并且在来自测量单元的测量值达到预定的复位负荷之后,使控制部件沿远离基准部件的方向移动。 。当来自测量单元的测量值连续至少两次等于清洁部件的每单位移动量的时间点时,控制单元执行重置操作,在该操作中,设置清洁部件在该时间点的位置在清洁时,将清洁部件的基准位置作为清洁部件的基准位置,并且将来自测量单元的时间点的测量值设置为清洁期间的按压基准值。

著录项

  • 公开/公告号WO2018207704A1

    专利类型

  • 公开/公告日2018-11-15

    原文格式PDF

  • 申请/专利权人 EBARA CORPORATION;

    申请/专利号WO2018JP17539

  • 申请日2018-05-02

  • 分类号H01L21/304;

  • 国家 WO

  • 入库时间 2022-08-21 11:58:06

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