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ACOUSTIC MANAGEMENT IN INTEGRATED CIRCUIT USING PHONONIC BANDGAP STRUCTURE

机译:使用带隙结构的集成电路中的声学管理

摘要

An encapsulated integrated circuit (100) includes an integrated circuit (IC) die (102). A phonon device (1 10, 111) is fabricated on the IC die (102) that is configured to emit (112) or to receive (113) phonons that have a range of ultrasonic frequencies. An encapsulation material (120) encapsulates the IC die (102). A phononic bandgap structure (121, 123) is included within the encapsulation material (120) that is configured to have a phononic bandgap with a frequency range that includes at least a portion of the range of ultrasonic frequencies. A phononic channel (115) is located in the phononic bandgap structure (121, 123) between the phonon device (110, 111) and a surface of the encapsulated IC die (102).
机译:封装的集成电路(100)包括集成电路(IC)管芯(102)。在IC管芯(102)上制造了声子器件(1 10、111),其被配置为发射(112)或接收(113)具有一定范围的超声频率的声子。封装材料(120)封装IC管芯(102)。声子带隙结构(121、123)被包括在封装材料(120)内,该材料被配置为具有频率范围包括至少一部分超声频率范围的声子带隙。声子通道(115)位于声子器件(110、111)和封装的IC管芯(102)的表面之间的声带隙结构(121、123)中。

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