NOVEL COMPOUND, PHOTOPOLYMERIZATION INITIATOR CONTAINING SAID COMPOUND, AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAID PHOTOPOLYMERIZATION INITIATOR

摘要

The purpose of the present invention is to provide: a novel compound which has excellent solvent solubility and compatibility with a resin, and which can generate bases and radicals with high efficiency by being irradiated with active energy rays; a photopolymerization initiator which contains said novel compound; and a photosensitive resin composition which contains said photopolymerization initiator and from which a cured product can be obtained that has high sensitivity and no metal corrosion. This novel compound is represented by formula (1). (In formula (1), R₁, R₂, R₃, R₅ and R₆ represent a hydroxyl group or an alkoxy group. The R₄'s independently represent an organic group containing a thioether bond. R₇ and R₉ independently represent a hydrogen atom or an alkyl group with 1 to 4 carbons. R₈ represents an alkylene group or an arylene group. X represents an oxygen atom or a sulfur atom.)