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MASK PATTERN GENERATION BASED ON FAST MARCHING METHOD
MASK PATTERN GENERATION BASED ON FAST MARCHING METHOD
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机译:基于快速行列法的模板图案生成
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摘要
Methods, apparatuses, and systems for determining a binary mask pattern from a pixelated mask pattern include: determining, by a processor, based on a fast marching method (FMM), arrival values for pixels of a portion of the pixelated mask pattern; determining the binary mask pattern based on the arrival values; and updating at least one of the arrival values based on a comparison between a design pattern corresponding to the pixelated mask pattern and a substrate pattern simulated based on the binary mask pattern.
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