STORAGE AND SUB-ATMOSPHERIC DELIVERY OF DOPANT COMPOSITIONS FOR CARBON ION IMPLANTATION

摘要

A supply source for delivery of the CO-containing dopant gas composition is provided. The composition comprises a controlled amount of diluent gas mixture, such as xenon and hydrogen, each provided at a controlled volume ratio to ensure optimal carbon ion implantation performance. The composition may be packaged as a dopant gas kit consisting of a CO-containing feed source and a diluent mixture feed source. Alternatively, the composition can be pre-mixed and removed from a single source that can be operated to enable controlled flow of the dopant mixture from the internal volume of the device in response to sub-atmospheric conditions achieved along the exit flow path Source device.