RESISTANCE MEASUREMENT APPARATUS SUBSTRATE INSPECTION APPARATUS AND RESISTANCE MEASUREMENT METHOD

摘要

Provided are a resistance measurement apparatus, a substrate inspection apparatus, and a resistance measurement method, capable of easily improving resistance measurement precision using a four-terminal measurement method, comprising: a current probe (Pc1, Pc2) brought into contact with a chip-side electrode (A1); a detection probe (Pv1, Pv2) brought into contact with an outward electrode (A2); a voltage detection unit (4) for detecting a voltage between the detection probe (Pv1 and Pv2); a constant current source (CS1) with its positive electrode connected to the current probe (Pc1) and its negative electrode connected to a ground and outputting a current of a first current value (I_1); a constant current source (CS2) with its positive electrode connected to the negative electrode of the constant current source (CS1) and the ground and its negative electrode connected to the current Probe (Pc2) and outputting a current of a second current value (I_2) which is substantially the same as the first current value (I_1); a ground probe (PG) connecting a wiring (A3) to the ground; and a resistance obtaining unit (51) for obtaining a resistance of the wiring (A3) based on the voltage detected by the voltage detection unit (4).