Method for repairing backing plate for sputtering target, sputtering target using maintenance-completed backing plate and maintenance-completed backing plate

摘要

An embodiment of the present invention is a method of repairing a backing plate 20 including a base 22 made of copper having a defective portion 24 and includes a step of polishing the surface of the defected portion 24, And a step of spraying and depositing the repairing particles onto the defects (24) after the step of polishing, wherein the repairing particles include copper particles and ceramic particles.