Resistivity-based adjustment of measurements from in-situ monitoring

摘要

A correlation function is stored that relates the thickness of the conductive layer having the first resistivity value and the first resistivity value to a signal from the in-situ monitoring system. A second resistivity value for the conductive layer on the substrate is received. From an in-situ electromagnetic induction monitoring system that monitors the substrate during polishing, a series of signal values depending on the thickness of the conductive layer are received. A series of thickness values is generated based on the series of signal values and the correlation function. For at least some of the series of thickness values, adjusted thickness values are generated to compensate for the variation between the first resistivity value and the second resistivity value to produce a series of adjusted thickness values. An adjustment to the polishing parameter is determined or a polishing endpoint is detected based on the series of adjusted thickness values.