High Density Linear ICP Source and antenna structure for ICP source

摘要

The present invention relates to a plasma source, which comprises: a plasma chamber for providing any one of an electron beam and an ion beam to the outside; and at least one electron generator for communicating with the plasma chamber to supply a plurality of electrons into the plasma chamber. The high-density plasma source of the present invention can increase the density of plasma by supplying a plurality of electrons to the plasma formed in the plasma chamber by using the electron generator. An antenna structure according to the present invention includes: a first antenna rotated several times in a counterclockwise direction in a left region after being rotated several times in a clockwise direction in a right region; and a second antenna rotated several times in a clockwise direction in a right region after being rotated several times in a counterclockwise direction in a left region. The first and second antennas have a double-helical structure, wherein a clockwise rotation region and a counterclockwise rotation region are symmetrical to each other, thereby forming a generally uniform energy distribution. Moreover, plasma generated by a linear type antenna that a basic type of an antenna combination horizontally extends and a large area type antenna that the basic type of the antenna combination vertically and horizontally extends, has a generally uniform distribution.