METHOD FOR STRUCTURING A DECORATIVE OF TECHNICAL PATTERN IN AN OBJECT MADE OF AN AT LEAST PARTIALLY TRANSPARENT AMORPHOUS SEMI-CRYSTALLINE OR CRYSTALLINE MATERIAL

摘要

The present invention relates to a method for structuring a decoration or technique pattern (22, 26) in the thickness of an object formed of at least a partially transparent amorphous, hemicrystalline, or crystalline material. The object formed of at least a partially transparent material includes: an upper surface (18a); and a lower surface (18b) extended by being spaced from the upper surface (18a). The method includes a step of providing a mask defining at least an opening unit (25) to at least one among the upper surface (18a) or the lower surface (18b) of the object formed of the at least partially transparent material. An outline of the opening unit corresponds to a profile of the decoration or the technique pattern (22, 26), and the mask (24) covers the at least an upper surface (18a) or the lower surface (18b) of the object formed of the at least partially transparent material at positions of not being structured. The method also includes a step of structuring the decoration or the technique patter (22, 26) by a single charge or multi-charged ion beam (14) by passing through the at least an opening (25) of the mask (24). Mechanical properties of the mask (24) are enough to prevent ions of the ion beam (14) from etching at least one of the upper surface (18a) or the lower surface (18b) of the object formed of the at least partially transparent material at the positions in which the upper surface (18a) or the lower surface (18b) is covered by the mask (24).