CRITICAL DIMENSION UNIFORMITY MONITORING FOR EXTREME ULTRA-VIOLET RETICLES

摘要

A method and apparatus for facilitating inspection of a sample using an optical inspection tool is disclosed. The optical inspection tool is used to acquire an optical test image or signal from an EUV reticle that specifies intensity variations across the EUV reticle, which intensity variation is a function of the flare correction, such as flare, to produce a critical dimension uniformity (CDU) It is converted to a CD variation removing the calibration CD variation. These removed flare correction CD variations result from design data for manufacturing EUV reticles, and such flare correction CD variations are generally designed to compensate for the flare difference that appears over the field of view (FOV) of the photolithography tool during the photolithographic process . The CDU map is stored in one or more memory elements and / or displayed on, for example, a test tool or a display device of a photolithography system.