According to the present invention, there is provided a plasma processing apparatus comprising: a plurality of body plates having mutually opposed faces closely arranged; a semicircular scattering groove formed in a symmetrical state on mutually facing surfaces of the plurality of body plates; And an engaging means provided at both ends of the main plate for providing the artificial scattering field. The artificial scattering fields are arranged such that a plurality of body plates are disposed in close contact with each other, and both ends of the plurality of body plates are fixedly coupled so as to be separable by coupling means. In addition, a plurality of body plates are formed in a symmetrical state with a semicircular scattering groove on a mutually facing surface, so that scattering is made to the inside of the scattering groove in a state in which the plurality of body plates are disposed closely to each other. It is possible to remove the plurality of body plates and to take out the eggs stably without damaging them.
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