IMPRINTING DEVICE IMPRINTING METHOD AND ARTICLE MANUFACTURING METHOD

摘要

An object of the present invention is to provide an imprint apparatus capable of detecting the surface state of a substrate with high precision even if the surface state of the substrate changes. An imprint apparatus according to the present invention is an imprint apparatus for forming a pattern of an imprint material on a substrate by bringing the imprint material on the substrate into contact with the substrate and irradiating the substrate with light and optically detecting reflected light from the substrate And a detection unit for detecting the state of the imprint material on the substrate and switching detection conditions during the imprint process.