PVD EDGE UNIFORMITY IMPROVEMENT IN PVD ARRAY COATERS

摘要

An apparatus for depositing a material on a substrate is described. The apparatus includes a deposition array 222 having three or more cathodes 122 and the deposition array includes a first outer deposition assembly 301 comprising at least a first of three or more cathodes ); A second outer deposition assembly (302) opposite the first outer deposition assembly, wherein the second outer deposition assembly comprises at least a second cathode of three or more cathodes, and a second outer deposition assembly (302) positioned between the first outer deposition assembly and the second outer deposition assembly , And an inner deposition assembly (303) comprising at least one inner cathode. At least one of the first outer deposition assembly 301 and the second outer deposition assembly 302 is configured to deposit the material at a higher rate than the inner deposition assembly 303 on the same substrate at the same time.