首页> 外国专利> Block for centering semiconductor wafers on a vacuum stage in a photolithography cluster line before carrying out technological operations

Block for centering semiconductor wafers on a vacuum stage in a photolithography cluster line before carrying out technological operations

机译:在进行技术操作之前,将半导体晶圆在光刻机生产线上的真空台上对中的模块

摘要

The utility model relates to devices specifically designed for positioning, orienting and centering semiconductor wafers, and can be used in semiconductor manufacturing in the manufacture of ICs, LSIs and VLSIs in the photolithography cluster line before carrying out technological operations, in particular, before centrifugation. Essence: the unit includes two centering pushers with horizontal movement mechanisms, placed diametrically opposite on a common platform with a vertical movement drive, which are made in the form of strips with a stepped segmented ring groove facing the vacuum table, while the groove recesses are made of at least along two circles, the diameters of which correspond to the diameters of the plates being machined, and the axes of the grooves coincide with the center of the vacuum table during the centering process Nia plates. The technical result is to reduce the downtime of equipment for replacement in a centrifuge of a vacuum table when changing the diameter of the processed plates. 7 ill.
机译:本实用新型涉及一种专门用于半导体晶片的定位,定向和定心的装置,在进行技术操作之前,特别是在离心分离之前,可用于制造光刻机生产线中的IC,LSI和VLSI的半导体制造中。实质:该单元包括两个带水平运动机构的定心推动器,两个定心推动器沿直径方向相对放置在带有垂直运动驱动器的公共平台上,这些定心推动器以条状制成,并具有面向真空台的阶梯状分段环形凹槽,凹槽的凹槽至少由两个圆组成,其直径对应于被加工的板的直径,并且在定心过程中,凹槽的轴线与真空台的中心重合。技术结果是减少了在改变处理后的板的直径时在真空工作台的离心机中更换设备的停机时间。 7病了。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号