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Confocal microscope for layer thickness measurement and microscopy method for coating thickness measurement

机译:共焦显微镜用于层厚度测量和显微镜方法用于涂层厚度测量

摘要

A confocal microscope for layer thickness measurement comprises: optical elements for directing and focusing illumination light on a sample; a focus adjustment device, with which a relative displacement between a focus position of the illumination light and a sample position is made along an optical axis of the confocal microscope; a confocal light measuring device, with which measurement signals can be received at different settings of the focus adjustment device; an evaluation device for determining a layer thickness of the sample, for which purpose the evaluation device determines intensity band positions of at least two intensity bands from a measurement curve recorded by the light measurement device, which indicates a measured light intensity as a function of the focus position, and at a position difference between the intensity band positions Layer thickness closes. The evaluation device is set up to conclude the layer thickness with the aid of a mathematical model which describes for overlapping intensity bands a dependence of the intensity band positions of at least one light wavelength and the layer thickness taking into account interference of the illumination light at the layer.
机译:用于层厚测量的共聚焦显微镜包括:用于将照明光引导并聚焦在样品上的光学元件;焦点调节装置,利用该焦点调节装置沿着共聚焦显微镜的光轴在照明光的焦点位置和样本位置之间产生相对位移。共焦光测量装置,利用该共焦光测量装置可以在焦点调节装置的不同设置下接收测量信号;用于确定样品的层厚的评估装置,为此目的,评估装置从由光测量装置记录的测量曲线中确定至少两个强度带的强度带位置,该测量曲线指示所测量的光强度作为光强度的函数。聚焦位置,以及在强度带位置之间的位置差处,层厚度关闭。评估装置被设置为借助于数学模型得出层厚度,该数学模型描述了对于重叠的强度带,考虑到照明光在20nm处的干扰,至少一个光波长的强度带位置与层厚度之间的关系。层。

著录项

  • 公开/公告号DE102017116745A1

    专利类型

  • 公开/公告日2019-01-31

    原文格式PDF

  • 申请/专利权人 CARL ZEISS MICROSCOPY GMBH;

    申请/专利号DE201710116745

  • 发明设计人 MATTHIAS VAUPEL;NILS LANGHOLZ;

    申请日2017-07-25

  • 分类号G01B11/02;G01N21/25;G01N21/64;G02B21;G01B11/24;G01B11/06;G01B9/04;

  • 国家 DE

  • 入库时间 2022-08-21 11:45:27

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