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MASK-LESS PATTERNING OF AMORPHOUS SILICON LAYERS FOR LOW-COST SILICON HETERO-JUNCTION INTERDIGITATED BACK-CONTACT SOLAR CELLS
MASK-LESS PATTERNING OF AMORPHOUS SILICON LAYERS FOR LOW-COST SILICON HETERO-JUNCTION INTERDIGITATED BACK-CONTACT SOLAR CELLS
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机译：低成本硅异质结互扩散背接触式太阳能电池非晶硅层的无掩模图案化
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摘要
The present invention is in the field of a method for mask-less patterning of amorphous silicon layers, such as for low-cost silicon hetero-junction interdigitated back-contact solar cells, solar-cells and PV-panels obtainable by said method, in particular Silicon-Heterojunction (SHJ) interdigitated back-contacted (IBC) solar cells.
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