MONITORING METHOD FOR TOTAL AMOUNT OF SULFUR-CONTAINING COMPOUND IN METAL PLATING BATH

摘要

To provide a monitoring method for a total amount of a sulfur-containing compound having at least one sulfur atom having an oxidation state less than +6, in a metal plating bath or in a metal alloy plating bath.SOLUTION: A monitoring method for a total amount of a sulfur-containing compound includes steps of: (a) preparing a measurement sample containing one or more kinds of sulfur compounds and one or more kinds of reducers; (b) generating an anodic oxidation current by performing anode oxidation of the reducer in an electrode in the presence of one or more kinds of sulfur compounds, by bringing the electrode into contact with the measurement sample in a measuring unit having a working electrode, and simultaneously obtaining current data by measuring the anodic oxidation current; (c) obtaining current processed data by processing the current data obtained optionally in the step (b); and (d) comparing the current data obtained in the step (b) or the current processed data obtained in the step (c) with data or processed data of at least one reference anodic oxidation current obtained from a reference sample.SELECTED DRAWING: Figure 1