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Nano-embossed structure, method for producing nano-embossed structure, and polymerizable material for producing nano-embossed structure

机译:纳米压纹结构,制备纳米压纹结构的方法和可聚合材料用于制备纳米压纹结构

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a nano embossed structure, capable of forming a nano embossed structure consisting of fine uneven structure without performing a complicated etching process, etc., to simply and efficiently manufacture the nano embossed structure.SOLUTION: A method for manufacturing a nano embossed structure comprises the steps of: preparing a polymerizable material including at least one kind of polyfunctional acrylic monomers (A) selected from tetra- to octa-functional acrylic monomers and at least one kind of monomers (B) selected from monomers having 1-3 of the number of functional group having a carbon-carbon double bond, and having 70 mol% or more of the content of the polyfunctional acrylic monomer (A) to the total amount of the polyfunctional acrylic monomer (A) and the monomer (B); forming a film consisting of the polymerizable material; and forming the nano embossed structure on a surface contacting the oxygen of the film by irradiating the film with light in an oxygen containing atmosphere to perform photopolymerization.SELECTED DRAWING: None
机译:解决的问题:提供一种制造纳米压纹结构的方法,该方法能够形成由精细的凹凸结构组成的纳米压纹结构,而无需执行复杂的蚀刻工艺等,以简单有效地制造该纳米压纹结构。一种用于制造纳米压花结构的方法,包括以下步骤:制备可聚合材料,该材料包括至少一种选自四官能至八官能丙烯酸单体的多官能丙烯酸单体(A)和至少一种选自以下的单体(B)。从具有碳-碳双键的官能团数的1-3,且多官能丙烯酸类单体(A)的含量为70摩尔%以上的单体到多官能丙烯酸类单体(A)的总量和单体(B);形成由可聚合材料组成的膜;通过在含氧气氛中用光照射膜以进行光聚合,并在与膜的氧接触的表面上形成纳米压花结构。

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