ELECTROSTATIC CHUCK, FOCUS RING, SUPPORT PLATFORM, PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

摘要

To provide an electrostatic chuck that can decrease a difference between an electric field above a substrate and an electric field above a focus ring, and that can suppress its damage due to plasma processing.SOLUTION: An electrostatic chuck according to an exemplary embodiment comprises a first region and a second region. The first region has a first upper surface. The first region is constituted to hold a substrate mounted on the first upper surface. The second region has a second upper surface. The second region is extended in a circumferential direction so as to surround the first region. The second region is constituted to support a focus ring mounted on the second upper surface. The first upper surface and the second upper surface are extended along a single flat surface. The first region and the second region provide a space which isolates between the first upper surface and the second upper surface from each other.SELECTED DRAWING: Figure 2