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Gas flow controller, gas flow meter and gas flow sensor

机译:气体流量控制器,气体流量计和气体流量传感器

摘要

PROBLEM TO BE SOLVED: To provide a gas flow rate control device attaining the miniaturization of a device and the reduction in the manufacturing cost and applicable for a gas flow rate control of a large flow rate from a minute flow rate.SOLUTION: A gas flow rate control device includes a configuration such that gas flow rate adjustment means for adjusting a mass flow rate of a gas that flows a gas flow passage is composed of a gas flow rate control valve 2 having a direct operated stepping motor 16 as an actuator for making a valve body open/close a valve body, and gas flow rate measurement means for measuring the mass flow rate of the gas that flows the gas flow passage is composed of a gas flow rate meter 3 having a heat type MEMS flow sensor chip 35 for detecting a flow of the gas. The gas flow rate control valve 2 and the gas flow rate meter 3 are device units integrated with or separated from each other, and both these device units comprise an integrally connectable structure by a fixing base 5.SELECTED DRAWING: Figure 3
机译:解决的问题:提供一种气体流量控制装置,其能够实现装置的小型化并降低制造成本,并且适用于从微小流量开始大流量的气体流量控制。解决方案:气体流量速率控制装置包括这样的结构,即,用于调节流过气体通道的气体的质量流量的气体流量调节装置由具有直接驱动的步进电动机16作为致动器的气体流量控制阀2构成。阀体打开/关闭阀体,并且用于测量在气体流道中流动的气体的质量流率的气体流率测量装置包括具有热型MEMS流量传感器芯片35的气体流率计3。检测气流。气体流速控制阀2和气体流速计3是彼此集成或分离的设备单元,并且这两个设备单元均通过固定底座5构成可整体连接的结构。

著录项

  • 公开/公告号JP6731594B2

    专利类型

  • 公开/公告日2020-07-29

    原文格式PDF

  • 申请/专利权人 アルメックスコーセイ株式会社;

    申请/专利号JP20150198182

  • 发明设计人 高橋 宏和;広友 史郎;

    申请日2015-10-06

  • 分类号G05D7/06;G01F1;G01F1/692;G01F1/684;F16K1/04;F16K31/04;

  • 国家 JP

  • 入库时间 2022-08-21 11:33:29

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