System and method for monitoring cleaning conditions of facility using cleaning apparatus with tracking feature

摘要

Systems and methods for monitoring the cleaning conditions of a facility include the use of a cleaning apparatus with a tracking device. The tracking device is adapted to detect an operating parameter of the cleaning apparatus. In embodiments, the operating parameter includes at least one of the location of the cleaning apparatus within a facility over time, the movement of the cleaning apparatus, and the dynamic coefficient of friction encountered by a cleaning head of the cleaning apparatus as it traverses a surface being cleaned in the facility.