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Microwave probe, plasma monitoring system including the microwave probe, and method for fabricating semiconductor device using the system
Microwave probe, plasma monitoring system including the microwave probe, and method for fabricating semiconductor device using the system
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机译:微波探头,包括该微波探头的等离子体监视系统以及使用该系统的半导体器件的制造方法
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摘要
Disclosed herein are a microwave probe capable of precisely detecting a plasma state in a plasma process, a plasma monitoring system including the probe, and a method of fabricating a semiconductor device using the system. The microwave probe includes a body extending in one direction and a head which is connected to one end of the body and has a flat plate shape. In addition, in the plasma process, the microwave probe is non-invasively coupled to a chamber such that a surface of the head contacts an outer surface of a viewport of the chamber, and the microwave probe applies a microwave into the chamber through the head and receives signals generated inside the chamber through the head.
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