TRIPHENYLGERMYLSILANE AND TRICHLOROSILYL-TRICHLOROGERMANE FOR THE PRODUCTION OF GERMANIUM-SILICON LAYERS, AND METHOD FOR THE PRODUCTION THEREOF FROM TRICHLOROSILYL-TRIPHENYLGERMANE

摘要

Triphenylgermylsilane (Ph₃Ge—SiH₃) is useful for the production of germanium-silicon layers (Ge—Si) or as transfer agent of silane groups (SiH₃). Further, a method describes the production of triphenylgermylsilane (Ph₃Ge—SiH₃) by reducing trichlorosilyltriphenylgermane (Ph₃Ge—SiCl₃) with a hydride in solution, and another method describes the production of trichlorosilyltrichlorogermane (C₃Ge—SiCl₃) by reacting trichlorosilyltriphenylgermane (Ph₃Ge—SiCl₃) with hydrogen chloride (HCl) in the presence of AlCl₃ in solution. In addition, trichlorosilyltrichlorogermane is also used for the production of germanium-silicon layers (Ge—Si).