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Pellicle frame, pellicle containing same, method for producing pellicle frame, and method for producing pellicle
Pellicle frame, pellicle containing same, method for producing pellicle frame, and method for producing pellicle
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机译:薄膜框架,包含该薄膜框架的防护膜,防护膜框架的制造方法以及防护膜的制造方法
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摘要
The purpose of the present invention is to provide: a pellicle frame which is not susceptible to deterioration even if irradiated with short-wavelength light such as excimer light, and which is not susceptible to generation of an outgas or foreign substance; and a pellicle which uses this pellicle frame. In order to achieve the above-described purpose, this pellicle frame for supporting the outer periphery of a pellicle film is configured to comprise a frame and a film that is formed on the surface of the frame and contains a polyimide resin.
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