PRODUCING METHOD FOR GOLD SPUTTERING TARGET AND PRODUCING METHOD FOR GOLD FILM

摘要

A production method for a gold sputtering target includes: producing a gold sputtering target which is made of gold and inevitable impurities and in which an average value of Vickers hardness is 40 or more and 60 or less, an average value of crystal grain size is 15 μm or more and 200 82 m or less, and the {110} plane of gold is preferentially oriented to a surface to be sputtered of the gold sputtering target.