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METHOD FOR FORMING A FUNCTIONALISED GUIDE PATTERN FOR A GRAPHOEPITAXY METHOD
METHOD FOR FORMING A FUNCTIONALISED GUIDE PATTERN FOR A GRAPHOEPITAXY METHOD
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机译:绘制图表法的功能化指南格式的方法
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摘要
A method for forming a functionalised guide pattern, includes forming a functionalisation layer on a substrate; depositing a protective layer on the functionalisation layer; forming a guide pattern on the protective layer that has a cavity opening onto the protective layer and a bottom and side walls; implanting ions with an atomic number of less than 10 in a portion of the protective layer located at the bottom of the cavity, such that the implanted portion can be selectively etched relative to the non-implanted portion; forming, in the cavity, a second functionalisation layer having first and second portions disposed on, respectively, the protective layer at the bottom of the cavity and the side walls of the cavity; and selectively etching the implanted portion and the first portion of the second functionalisation layer, to expose a portion of the functionalisation layer located at the bottom of the cavity.
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