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STAIRCASE STRUCTURE WITH MULTIPLE DIVISIONS FOR THREE-DIMENSIONAL MEMORY

机译:多维存储器的多维空间结构

摘要

Embodiments of staircase structures of a three-dimensional memory device and fabrication method thereof are disclosed. The semiconductor structure includes a first and a second film stacks, wherein the first film stack is disposed over the second film stack and has M1 number of layers. The second film stack has M2 number of layers. M1 and M2 are whole numbers. The semiconductor structure also includes a first and a second staircase structures, wherein the first staircase structure is formed in the first film stack and the second staircase structure is formed in the second film stack. The first and second staircase structures are next to each other with an offset.
机译:公开了三维存储器件的阶梯结构及其制造方法的实施例。该半导体结构包括第一和第二膜堆叠,其中第一膜堆叠设置在第二膜堆叠上方并且具有M 1 层。第二膜堆具有M 2 层数。 M 1 和M 2 是整数。半导体结构还包括第一和第二阶梯结构,其中第一阶梯结构形成在第一膜堆叠中,而第二阶梯结构形成在第二膜堆叠中。第一楼梯结构和第二楼梯结构彼此偏移。

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