Exposure device for a photolithography method, assembly having an exposure device and method for exposing a substrate coated with a photoresist

摘要

Exposure device (12) for a photolithography method, comprising a light source (16), a lens mask (18) and a chuck (34). The lens mask (18) is provided between light source (16) and chuck (34), is disposed substantially parallel to the chuck (34) and comprises at least two focussing elements (42), each with a focal point (44). The exposure device (12) is arranged such that during exposure all focussing elements (42) of the lens mask (18) are always illuminated by the light source (16). An assembly (10) is provided with a substrate (14), in particular a wafer, and said exposure device (12). The substrate (14) is disposed on the chuck (34). The number of focussing elements (42) of the lens mask (18) corresponds to a number of the dies (48) provided on the substrate (14). A method for exposing a substrate (14) coated with a photoresist is described.