首页> 外国专利> METHOD FOR OPTIMIZING PRIVACY MASK OF CAMERA OF WHICH PANNING AND TILTING ARE CONTROLLED, AND IMAGING DEVICE TO WHICH PRIVACY MASK OPTIMIZATION IS APPLIED

METHOD FOR OPTIMIZING PRIVACY MASK OF CAMERA OF WHICH PANNING AND TILTING ARE CONTROLLED, AND IMAGING DEVICE TO WHICH PRIVACY MASK OPTIMIZATION IS APPLIED

机译:控制平移和倾斜的相机的隐私面罩的优化方法,以及适用于隐私面罩优化的成像装置

摘要

The present invention relates to a method for correcting the location of a privacy mask, and a method for performing panning or tilting, and performing masking by using a privacy mask for an image captured by an imaging device in which the rotation axis of an imaging unit and the center of a lens do not correspond comprises the steps of: generating a mask for an object under a first imaging condition; and performing masking for the object under a second imaging condition by correcting a mask location error that occurs when applying, to the second imaging condition, the mask generated under the first imaging condition, wherein the first imaging condition is the same as the second imaging condition with respect to the imaging angle of the lens, and is reversed with the second imaging condition around the rotation axis with respect to the location of the lens, and the mask location error occurs because of the location difference of the imaging device under the first imaging condition and the second imaging condition, thereby allowing a flip and enabling normal masking during the flip in the imaging device, in which the rotation axis of the camera and the center of the lens do not correspond.
机译:技术领域本发明涉及一种用于校正隐私掩模的位置的方法,用于执行平移或倾斜,以及通过使用隐私掩模对由成像单元捕获的图像进行成像的图像的方法,其中成像单元的旋转轴透镜中心不对应的步骤包括:在第一成像条件下为物体生成掩模;通过校正将在第一成像条件下生成的掩模应用于第二成像条件时发生的掩模位置误差,对第二成像条件下的物体进行掩模,其中,第一成像条件与第二成像条件相同相对于镜头的成像角度,并且在围绕镜头旋转轴的第二成像条件下相对于镜头的位置反转,并且由于第一次成像时成像设备的位置差异而导致掩模位置误差条件和第二成像条件,从而允许在成像设备中进行翻转并在翻转期间启用正常遮罩,其中相机的旋转轴与镜头的中心不对应。

著录项

  • 公开/公告号WO2019240347A1

    专利类型

  • 公开/公告日2019-12-19

    原文格式PDF

  • 申请/专利权人 HANWHA TECHWIN CO. LTD.;

    申请/专利号WO2019KR00545

  • 发明设计人 PARK JONG IN;OH JUNG SUK;KIM DAE BONG;

    申请日2019-01-14

  • 分类号H04N5/232;H04N5/225;

  • 国家 WO

  • 入库时间 2022-08-21 11:14:14

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号