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OPTICAL ELEMENT FOR REFLECTING VUV RADIATION AND OPTICAL ARRANGEMENT

机译:反射VUV辐射和光学布置的光学元件

摘要

The invention relates to an optical element (4) for reflecting radiation in the VUV wavelength range, comprising: a substrate (41), and a reflective coating (42) which is applied to the substrate (41) and has at least one aluminium layer (43). At least one hydrogen-catalytic layer (45) for dissociation of molecular hydrogen (Ha) is applied to the aluminium layer (43). The invention also relates to an optical arrangement for the VUV wavelength range, comprising: an interior, in which at least one optical element is arranged, and at least one gas inlet for feeding a gas into the interior. In an aspect of the invention, the optical element (4) is designed as described above and the gas inlet serves to feed hydrogen into the interior. In another aspect of the invention, the optical arrangement comprises a plasma-generating device for feeding a plasma gas through the gas inlet into the interior to generate an atmospheric-pressure plasma on at least a portion of an optical surface of the optical element.
机译:本发明涉及一种用于反射VUV波长范围内的辐射的光学元件(4),该光学元件包括:基底(41);和反射涂层(42),该反射涂层涂覆在基底(41)上并具有至少一个铝层。 (43)。用于铝的分子解离的至少一个氢催化层(45)被施加到铝层(43)上。本发明还涉及一种用于VUV波长范围的光学装置,该光学装置包括:内部,在内部布置有至少一个光学元件;以及至少一个气体入口,用于将气体馈送到内部。在本发明的一个方面,光学元件(4)如上所述地设计,并且进气口用于将氢气供给到内部。在本发明的另一方面,光学装置包括等离子体产生装置,该等离子体产生装置用于通过气体入口将等离子体气体馈送到内部,以在光学元件的光学表面的至少一部分上产生大气压等离子体。

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