MANUFACTURING METHOD FOR FLEXIBLE TFT SUBSTRATE AND MANUFACTURING METHOD FOR FLEXIBLE OLED PANEL

摘要

Provided in the present invention are a manufacturing method for a flexible TFT substrate and a manufacturing method for a flexible OLED panel. The manufacturing method for a flexible TFT substrate according to the present invention uses a physical vapor deposition (PVD) method to deposit and form a source-drain metal layer by means of sputtering corresponding elements. In the process of depositing the source-drain metal layer by means of PVD, the inner temperature of a sputtering chamber is 90-100°C, and the sputtering power is 20-30 kW. Thus, the inner temperature and the sputtering power of the sputtering chamber used when depositing a source-drain metal layer by PVD are less than those of the prior art, thereby reducing heat of an organic photoresist block in a deep hole for bending accumulated in the process of depositing the source-drain metal layer, which can prevent outgassing of the organic photoresist block in the deep hole for bending, reduce the risk of breakage and detachment of the source-drain metal layer at this position, and significantly improve the properties of the flexible TFT substrate and product yields.