FIBONACCI COIL FOR PLASMA PROCESSING CHAMBER

摘要

A system for processing semiconductor substrates includes a processing chamber, a coil, and a generator. The processing chamber includes a dielectric window and is configured to process a semiconductor substrate using an inductively coupled plasma. The coil is arranged on the dielectric window. The coil includes a circular center portion. The coil includes a plurality of legs extending spirally outward from the circular center portion parallel to the dielectric window. Each of the legs is a Fibonacci spiral. The generator is configured to supply RF power to the circular center portion of the coil to generate the inductively coupled plasma in the processing chamber when a process gas is supplied to the processing chamber.